Effects of Chemical Regulators on Culm Lodging Resistance,Plant Uniformity and Yield of Winter Wheat

doi:10.3969/j.issn.1000-6362.2015.02.007

Abstract

Abstract: In 2008/2009 and 2009/2010 winter wheat growing seasons， experiments were conducted in experimental field to study the effects of chemical regulators on culm lodging resistance， plant uniformity， and winter wheat grain yield. Three treatments including in the experiments， i.e.， spraying 15% paclobutrazol wettable powders （PP333， 600g·ha-1）， 50% chormequat water aqua （CCC， 1000mL·ha-1）， combined PP333 with CCC （P+C， 300g·ha-1PP333 and 1000mL·ha-1 CCC）， and spraying water as control （CK） at recovery stage on 1st March. Plant height （PH）， culm height of gravity center （CHGC）， length of the 2nd basal internode （L）， outer diameter of the 2nd basal internode （OD）， wall thickness（WT）， filling degree （FD）， and culm mechanical strength （CMS）were investigated， and cellulose content， lignin content， nitrogen content， and C/N ratio of the 2nd basal internode were determined at milkripe stage; Meanwhile， the area of lodging was observed and culm lodging resistance index （CLRI） and lodging rate （LR） were calculated at maturity stage， and winter wheat grain yield and the relationship between the grain yield and plant uniformity was analyzed by spikes test. The results indicated that PH， L， and CHGC were reduced， and OD， WT， FD， CMS of the 2nd basal internode were increased in P+C treatment， then followed by PP333， and the lowest was CCC. As the indices of lodging resistance， the highest value of cellulose content， lignin content， C/N ratio was observed in P+C， then followed by PP333， and the lowest value was found in CCC. The CLRI was the highest in P+C treatment， followed by PP333， and the lowest was found in CCC treatment; Therere no lodging was found in both P+C and PP333 treatments， and the lodging rates in 2008/2009 and 2009/2010 winter wheat growing seasons were 11.3% and 6.7%， respectively. The plant uniformity was significantly higher in P+C than in CK， then followed by PP333， and the lowest was found in CCC. The same rule was found in grain yield， and a significant positive correlation between grain yields and the uniformities of PH， spike length， number of spikelet per spike， and spike weight was found in P+C which gained the highest yield. Therefore， with plant uniformity enhanced， the winter wheat grain yield increased．

Key words: PP333, CCC, Combination, Winter wheat, Lodging resistance, Plant uniformity, Yield

WANG Cheng yu， LI Jing， ZHANG Yi， LI Jincai， WEI Fengzhen. Effects of Chemical Regulators on Culm Lodging Resistance,Plant Uniformity and Yield of Winter Wheat[J]. Chinese Journal of Agrometeorology, 2015, 36(02): 170-177.

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